論文

平成28年度 (2016年度)

  1. S. Miyake, and K. Nakamae, “A quantum watermarking scheme using simple and smallscale quantum circuits,” Quantum Information Processing, vol. 15, pp. 1849-1864, 2016.
  2. K. Fukuhara, M. Suzuki, M. Mitsuyasu, T. Komukai, M. Hatano, T. Kono, T. Nakasugi, Y. Lim, W. Jung, K. Nakamae, “Overlay improvement in nanoimprint lithography for 13-nm patterning,” Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, vol. 34, no. 6, pp. 06K405-1-5, 2016.
  3. M. Harada, K. Obara, and K. Nakamae, “A robust SEM auto-focus algorithm using multiple band-pass filters,” Measurement Science and Technology, vol. 28, pp. 015403-1-10, 2016.
  4. M. Koguchi, R. Tsuneta, Y. Anan, and K. Nakamae, “Analytical electron microscope based on scanning transmission electron microscope with wavelength dispersive x-ray spectroscopy to realize highly sensitive elemental imaging especially for light elements,” Measurement Science and Technology, vol. 28, pp. 015904-1-9, 2016.

平成27年度 (2015年度)

  1. S. Miyake, and K. Nakamae, “A quantum watermarking scheme using simple and small-scale quantum circuits,” Quantum Information Processing, doi::10.1007/s11128-016-1260-9, 2016.

平成25年度 (2013年度)

  1. S. Kudo, Y. Hirose, T. Yamaguchi, K. Kashihara, K. Maekawa, K. Asai, N. Murata, T. Katayama, K. Asayama, N. Hattori, T. Koyama, and K. Nakamae, "Analysis of junction leakage current failure of nickel silicide abnormal growth using advanced transmission electron microscopy," IEEE Transactions on Semiconductor Manufacturing, vol.27, no.1, pp.16-21, Feb 2014.
  2. S. Kudo, Y. Hirose, Y. Ogawa, T. Yamaguchi, K. Kashihara, N. Murata, T. Katayama, N. Hattori, T. Koyama, and K. Nakamae, "Study of formation mechanism of nickel silicide discontinuities in high-performance complementary metal-oxide-semiconductor devices," Japanese Journal of Applied Physics, vol.53, no.2, p.021301, 2014.

平成24年度 (2012年度)

  1. 山下将嗣、大谷知行、松本徹、御堂義博、三浦克介、二川 清、中前幸治、斗内政吉, “テラヘルツ光放射を用いたLSI 故障解析”, 砥粒加工学会誌, vol. 56, no. 8, pp. 523-526 (Aug 2012).

平成23年度 (2011年度)

  1. M. Yamashita, C. Otani, T. Matsumoto, Y. Midoh, K. Miura, K. Nakamae, K. Nikawa, S. Kim, H. Murakami, and M. Tonouchi, "Thz emission characteristics from p/n junctions with metal lines under non-bias conditions for LSI failure analysis," Optics express, vol. 19, no. 11, pp. 10864&-10873, May 2011.

平成22年度 (2010年度)

  1. Sachiko Kobayashi, Suigen Kyoh, Toshiya Kotani, Yoko Takekawa, Soichi Inoue, and Koji Nakamae, "Full-Chip Layout Optimization for Process Margin Enhancement Using Model-Based Hotspot Fixing System," Jpn. J. Appl. Phys., vol. 49, pp. 06GB02-1-6 (2010).
  2. Ryo Nakagaki , Yuji Takagi and Koji Nakamae, "Automatic recognition of circuit patterns on semiconductor wafers from multiple scanning electron microscope images," '''Measurement Science and Technology, vol. 21, pp. 085501-1-14 (2010).
  3. H. Shinada, Y. Midoh, T. Shimakura and K. Nakamae, "Determining magnetic fields close to airbearing surface by projection electron-beam tomography and Fourier extrapolation," The Journal of Control, Measurement, and System Integration, vol. 3, no. 4, pp. 223-228 (2010).

平成21年度 (2009年度)

  • T. Imai, N. Takeda, M. Ito, K. Sekine, G. Sato, Y. Midoh, K. Nakamae, T. Kubo, "3D analysis of benign positional nystagmus due to cupulolithiasis in posterior semicircular canal," Acta Oto-Laryngologica, Volume 129, Issue 10, pages 1044-1049 (Oct. 2009).
  • R. Nakagaki, T. Honda and K. Nakamae, "Automatic recognition of defect areas on a semiconductor wafer using multiple scanning electron microscope images," Measurement Science and Technology, vol. 20, no. 7, pp. 075503 (Sep. 2009).

平成20年度 (2008年度)

  • K. Nikawa, S. Inoue, T. Nagaishi, T. Matsumoto, K. Miura and K. Nakamae, "New approach of laser-SQUID microscopy to LSI failure analysis," IEICE Trans. Electronics, VOL. E85-C, No. 3, pp.327-333, 2009.
  • A. Yasaka, F. Aramaki, M. Muramatsu, T. Kozakai, O. Matsuda, Y. Sugiyama, T. Doi, O. Takaoka, R. Hagiwara, and K. Nakamae, " Image quality improvement in focused ion beam photomask repair system," J. Vac. Sci. Technol. B, vol. 26, No.6(Nov/Dec), pp.2121-2123, 2008
  • A. Yasaka, F. Aramaki, M. Muramatsu, T. Kozakai, O. Matsuda, Y. Sugiyama, T. Doi, O. Takaoka, R. Hagiwara, and K. Nakamae, " Application of vector scanning in focused ion beam photomask repair system," J. Vac. Sci. Technol. B, vol. 26, No.6(Nov/Dec), pp.2127-2130, 2008.

平成19年度 (2007年度)

  • K. Nakamae, M. Chikahisa, H. Fujioka, "Estimation of electron probe profile from SEM image through wavelet multiresolution analysis for inline SEM inspection," Image and Vision Computing, vol. 25, no. 7, pp. 1117-1123 (July 2007).
  • T. Imai, N. Takeda, G. Sato, K. Sekine, M. Ito, K. Nakamae, T. Kubo, "Changes in slow phase eye velocity and time constant of positional nystagmus at transform from cupulolithiasis to canalolithiasis," Acta Oto-Laryngologica, vol. 128, no. 1, pp. 22 - 28 (August 2007).
  • T. Imai, N. Takeda, Go Sato, K. Sekine, M. Ito, K. Nakamae, T. Kubo, "Differential diagnosis of true and pseudo-bilateral benign positional nystagmus," Acta Oto-Laryngologica, vol. 128, no. 2, pp. 151-158 (August 2007).

平成18年度 (2006年度)

  • T. Imai, N. Takeda, M. Ito, K. Nakamae, H. Sakae, H. Fujioka, and T. Kubo, "Three-dimensional analysis of benign paroxysmal positional nystagmus in a patient with anterior semicircular canal variant," Otology & Neurotology, vol. 27, no. 3, pp. 362-366 (April 2006).
  • T. Imai, N. Takeda, M. Ito, K. Nakamae, H. Sakae, H. Fujioka, T. Matsunaga, and T. Kubo, "Benign paroxysmal positional vertigo due to a simultaneous involvement of both horizontal and posterior semicircular canals," Audiology & Neuro-Otology, vol. 11, no. 3, pp. 198-205 (2006).
  • Y. Midoh, K. Nakamae and H. Fujioka, "Object size measurement method from noisy SEM images by utilizing scale space," Measurement Science and Technology, vol. 18, no. 3. pp. 579-591 (2007).

平成17年度 (2005年度)

  • K. Miura, M. Fujita, K. Nakamae and H. Fujioka, "Pattern Matching Between an SEM Exposed Pattern Image of LSI Fine Structures and CAD Layout Data by Using the Relaxation Method," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 6, pp. 3065-3068 (Nov 2005).
  • T. Tominaga, K. Nakamae, T. Matsuo, H. Fujioka, T. Nakasugi, and K. Tawarayama, "Electron-beam direct writing system employing character projection exposure with production dispatching rule," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 6, pp. 2780-2783 (Nov 2005).

平成16年度 (2004年度)

  • K. Sekine, T. Imai, K. Nakamae, K. Miura, H. Fujioka, and N. Takeda, "Dynamics of the Vestibulo-ocular Reflex in Patients with the Horizontal Semicircular Canal Variant of Benign Paroxysmal Positional Vertigo," Acta Oto-Laryngologica, 124, 5, pp. 587-594 (June 2004).
  • K. Sekine, T. Imai, M. Morita, K. Nakamae, K. Miura, H. Fujioka, T. Kubo, K. Tamura, and N. Takeda, "Vertical canal function in normal subjects and patients with benign paroxysmal positional vertigo," Acta Oto-Laryngologica, 124, 9, pp. 1046-1052 (Nov 2004).
  • Y. Midoh, K. Miura, K. Nakamae, and H. Fujioka, "Statistical Optimization of the Canny Edge Detector for Measurement of Fine Line Patterns in the SEM Image of LSI," Meas. Sci. Technol., 16, 2, pp. 477-487 (Feb 2005).
  • Takao Imai, Kazunori Sekine, Kosuke Hattori, Noriaki Takeda, Izumi Koizuka, Koji Nakamae, Katsuyoshi Miura, Hiromu Fujioka, Takeshi Kubo, "Comparing the accuracy of video-oculography and the scleral search coil system in human eye movement analysis," Auris Nasus Larynx, 32, 1, pp. 3-9 (Mar 2005).

平成15年度 (2003年度)

  • W. Tamamura, K. Nakamae, and H. Fujioka, "Automatic LSI Package Lead Inspection System with CCD Camera for Backside Lead Specification," IEICE Trans. Electron., E86-C, 4, pp.661-667 (April 2003).
  • 立野善英, 中前幸治, 藤岡 弘, "少量多品種ロジックLSIの実製造デバイスデータを用いたウェーハテスト工程環境の評価:同時測定可能LSIテスタ環境とロット割付アルゴリズム", 電子情報通信学会論文誌C, J86-C, 11, pp. 1191-1201 (November 2003).
  • K. Naoi, K. Nakamae, H. Fujioka, T. Imai, K. Sekine, N. Takeda, and T. Kubo, "Three-Dimensional Eye Movement Simulator Extracting Instantaneous Eye Movement Rotation Axes, the Plane Formed by Rotation Axes, and Innervations for Eye Muscles," IEICE Trans. Inf. & Syst., E86-D, 11, pp. 2452-2462 (November 2003).

平成14年度 (2002年度)

  • T. Nakasugi, A. Ando, R. Inanami, N. Sasaki, K. Sugihara, M. Miyoshi, and H. Fujioka, "Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation," Jpn. J. Appl. Phys. Part I, 41, 6B, pp.4157-4162 (June 2002).
  • K. Nomura, K. Nakamae, and H. Fujioka, "EB Tester Line Delay Fault Loalization Algorithm for Combinational Circuits Considering CAD Layout," IEICE Trans. Inf. & Syst., E85-D, 10, pp. 1564-1570 (October 2002).
  • 中田晴己, 中前幸治, 藤岡 弘, 西山英利, "VLSIウェーハ製造工程における検査プロセス戦略の評価", 電子情報学会論文誌C, J85-C, 11, pp. 1016-1027 (November 2002).
  • T. Nakasugi, A. Ando, R. Inanami, N. Sasaki, T. Oota, K. Sugihara, O. Nagano, Y. Yamazaki, I. Mori, M. Miyoshi, K.Okumura, and H. Fujioka, "Maskless Lithography using Low Energy Electron-Beam: Recent Results of Proof-of-Concept Tool," J. Vac. Sci. Technol. B, 20, 6, pp. 2651-2656 (November 2002).
  • 中前幸治, 藤岡 弘, "LSIテスティングの最近の動向", 電子情報通信学会論文誌C, J86-C, 2, pp. 103-114 (February 2003).

平成13年度 (2001年度)

平成12年度 (2000年度)

  • M. Sanada, and H. Fujioka, "Fault Diagnosis Technique for Yield Enhancement of Logic LSI Using IDDQ," IEICE Trans. Fundamentals, E83-A, 5, pp. 842-850 (May 2000).  

平成11年度 (1999年度)以前

  1. K. Miura, K. Nakamae and H. Fujioka, "Automatic Tracing of Transistor-Level Performance Faults with CAD-Linked Electron Beam Test System," IEICE Trans. Fundamentals, E77-A, 3, pp.539-545 (March 1994).
  2. K. Nakamae, H. Sakamoto and H. Fujioka, "An Analysis of the Economics of the VLSI Development Including Test Cost," IEICE Trans. Fundamentals, E77-A, 4, pp. 698-705 (April 1994).
  3. H. Fujioka and K. Nakamae, "Invited: LSI Failure Analysis with CAD-Linked Electron Beam Test System and Its Cost Evaluation," IEICE Trans. Electron., E77-C, 4, pp. 535-545 (April 1994).
  4. K. Nakamae, H. Tanaka, H. Kubota and H. Fujioka, "Efficient Dynamic Fault Imaging by Fully Utilizing CAD Data in CAD-Linked Electron Beam Test System," IEICE Trans. Electron., E77-C, 4, pp. 546-551 (April 1994).
  5. K. Nakamae, R. Nakagaki, K. Miura and H. Fujioka, "Matching of DUT Interconnection Pattern with CAD Layout in the CAD-Linked Electron Beam Test System," IEICE Trans. Electron., E77-C, 4, pp. 567-573 (April 1994).
  6. K. Nakamae, M. Yamamoto, H. Kobayashi and H. Fujioka, "Restoration of Secondary Electron Images Degraded by Primary Electron Beam Profiles," J. Electron Microscopy, 43, 2, pp. 84-88 (April 1994).
  7. K. Nakamae, H. Sugimoto and Hiromu Fujioka, "Reconstruction of LSI Concave Microstructures by Parameter Sensitivity Search in the Best-Fitting Method," J. Electron Microscopy, 43, 6, pp.356-360 (Dec. 1994).
  8. K. Nakamae and H. Fujioka, "Voltage Waveform Measurements with an EB Tester Through Micrometre-Sized Holes Opened by Electron-Beam-Assisted Etching," Semicond. Sci. Technol., 10, 1, pp.114-116 (Jan. 1995).
  9. K. Nakamae, S. Komukai and H. Fujioka, "Potential Measurements on Floating-Field-Limiting Rings in a Power MOS FET by an Electron Beam Probe," Semicond. Sci. Technol., 10, 3, pp.249-254 (March 1995).
  10. K. Miura, K. Nakamae and H. Fujioka, "Automatic Transistor-Level Performance Fault Tracing by Successive Circuit Extraction from CAD Layout Data for VLSI in the CAD-Linked EB Test System," IEICE Trans. Electron., E78-C, 11, pp.1607-1617 (Nov. 1995).
  11. K. Nakamae, H. Sakamoto and H. Fujioka, "How ATE Planning Affects LSI Manufacturing Cost," IEEE Design & Test of Computers, 13, 4, pp.66-73 (Nov. 1996).
  12. 中前幸治,織田貴彦,藤岡 弘,“EBテストシステムにおける画像ベースの多重故障対応自動故障診断法”,電子情報通信学会論文誌D-I,J79-D-I, 12, pp.1162-1170 (Dec. 1996).
  13. 中前幸治,藤井正行,藤岡 弘,“LSI生産システムにおけるウェーハテスト工程の評価”,電子情報通信学会論文誌D-I,J79-D-I, 12, pp.1185-1191 (Dec. 1996).
  14. K. Miura, K. Nakamae and H. Fujioka, "Hierarchical Fault Tracing for VLSIs with Bi-Directional Busses from CAD Layout Data in the CAD-Linked EB Test System", IEICE Trans. Electron., E80-C, 3, pp.498-502 (March 1997).
  15. 近村晶央,中前幸治,藤岡 弘,“超LSI生産システムファイナルテスト工程のスケジューリングシミュレーションによるロット処理優先規則の評価”,電子情報通信学会論文誌C-II, J80-C-II, 4, pp.139-147 (April 1997).
    A. Chikamura, K. Nakamae and H. Fujioka, "Evaluation of Production Dispatching Rules through Scheduling Simulation in the Final Test Process of LSI Manufacturing System," Electronics and Communications in Japan, Part 2, 80, 6, pp.34-42 (June 1997).
  16. K. Miura, K. Nakamae and H. Fujioka, "Hierarchical VLSI Fault Tracing by Successive Circuit Extraction from CAD Layout Data in the CAD-Linked EB Test System," Journal of Electronic Testing: Theory and Applications, 10, 3, pp.255-269 (June 1997).
  17. 中前幸治、横山真司、大西篤志、藤岡 弘, "知識ベース構築による光学顕微鏡観測画像からの標準セル設計VLSI回路認識", 電子情報通信学会論文誌D-II, J80-D-II, 9, pp.2361-2368 (September 1997).
    K. Nakamae, S. Yokoyama, A. Onishi, and H. Fujioka, "Knowledge-Based Circuit Recognition from Standard-Cell Design CMOS VLSI Optical Microscope Images," Systems and Computers in Japan, Part 2, 80, 1, pp.70-78 (November 1997).
  18. A. Chikamura, K. Nakamae and H. Fujioka, "Influence of Lot Arrival Distribution on Production Dispatching Rule Scheduling and Cost in the Final Test Process of LSI Manufacturing System," IEE Proc.-Sci. Meas. Technol., 145, 1, pp.26-30 (January 1998).
  19. A. Chikamura, K. Nakamae and H. Fujioka, "Effect of Express Lots on Production Dispatching Rule Scheduling and Cost in VLSI Manufacturing Final Test Process," IEICE Trans. Electron., E82-C, 1, pp. 86-93 (January 1999).
  20. T. Imai, N. Takeda, M, Morita, I. Koizuka, T. Kubo, K. Miura, K. Nakamae, and H. Fujioka, "Rotation Vector Analysis of Eye Movement in Three Dimensions with Aninfrared CCD Camera," Acta OTO-LARYNGOLOGICA, 119, pp. 24-28 (1999).
  21. A. Chikamura, K. Nakamae and H. Fujioka, "Effect of 300mm Wafer Transition and Test Processing Logistics on VLSI Manufacturing Final Test Process Efficiency and Cost," IEICE Trans. Electron., E82-C, 4, pp. 638-645 (April 1999).
  22. A. Chikamura, K. Nakamae and H. Fujioka, "Verification of Wafer Test Process Simulation in VLSI Manufacturing System and its Application," IEICE Trans. Electron., E82-C, 6, pp. 1013-1017 (June 1999).
  23. 中前幸治, 石村貴志, 藤岡 弘, "故障シミュレーションとEBテスタテストパターン系列を利用した組合せ回路のEBテスタ故障位置特定アルゴリズム", 電子情報通信学会論文誌, J82-D-I, 7, pp. 933-939 (July 1999).
    K. Nakamae, T. Ishimura, H. Fujioka, "EB Tester Fault Localization Algorithm for Combinational Circuits by Utilizing Fault Simulation and Test Pattern Sequence for EB Tester," System and Computers in Japan, 31, 8, pp. 41-48 (July 2000).
  24. 真田 克, 藤岡 弘, "IDDQを用いた, 多様なリーク電流を有するCMOS LSIの故障診断", 電子情報通信学会論文誌D-I, J82-D-I, 7, pp. 940-949 (July 1999).
  25. F. Komatsu, M. Miyoshi, and H. Fujioka, "A New CD Measurement Method Linked with the Electrical Properties of Devices," IEICE Trans. Electron., E82-C, 7, pp. 1347-1352 (July 1999).
  26. K. Nakamae, H. Ohmori, and H. Fujioka, "A Simple VLSI Spherical Particle-Induced Fault Simulator: Application to DRAM Production Process," Microelectronics Reliability, No. 40, pp. 245-253, (February 2000).